Applied Nanoscience Group

2005

 

O’Dwyer, C., Gay, G., Lesegno, B. V. d., Weiner, J., Ludolph, K., Albert, D. & Oesterschulze, E.  Writing SAMs with Cs: Optimization of Atomic Nanolithography Imaging using Self-Assembled Monolayers on Au.

J. Appl. Phys. 97, 114309 (2005)

 

O’Dwyer, C., Buckley, D. N. & Newcomb, S. B. Simultaneous Observation of Current Oscillations and Porous Film Growth during Anodization of InP.

Langmuir 21, 8090-8095 (2005)

 

Mützel, M., Müller, M., Haubrich, D., Rasbach, U., Meschede, D., O’Dwyer, C., Gay, G., Lesegno, B. V. d., Weiner, J., Ludolf, K., Georgiev, G. & Oesterschultze, E. The Atom Pencil: Serial Writing in the Sub-Micrometer Domain.

Appl. Phys. B 80, 941-943 (2005)

 

O'Dwyer, C. STM Observation of Sulfur Dimerization in Alkanethiol Self-Assembled Monolayers on Au{111}.

Proc. Electrochem. Soc. 11, 123 (2005)

 

O’Dwyer, C., Gay, G., Lesegno, B. V. d., Weiner, J., Camposeo, A., Tantussi, F., Fuso, F., Allegrini, M. & Arimondo, E. Atomic Nanolithography Patterning of Sub-Micron Features: Writing an Organic Self-Assembled Monolayer with Cold, Bright Cs Atom Beams.

Nanotechnology 16, 1536-1541 (2005)

 

O'Dwyer, C. Nanoporous InP: Anodic Formation and Growth Mechanism in Aqueous Electrolytes.

Proc. Electrochem. Soc. 4, 40 (2005)

 

O’Dwyer, C., Gay, G., Lesegno, B. V. d., Weiner, J., Mützel, M., Haubrich, D., Meschede, D., Ludolph, K., Georgiev, G. & Oesterschulze, E. Advancing Atomic Nanolithography: Cold Atomic Cs Beam Exposure of Alkanethiol Self-Assembled Monolayers.

J. Phys. C 19, 109-117 (2005)